Simulating the fabrication of aluminium oxide tunnel junctions
نویسندگان
چکیده
Abstract Aluminium oxide (AlO x ) tunnel junctions are important components in a range of nanoelectric devices including superconducting qubits where they can be used as Josephson junctions. While many improvements the reproducibility and reliability have been made possible through new circuit designs, there still knowledge gaps relevant materials science. A better understanding how fabrication conditions affect density, uniformity, elemental composition barrier may lead to development lower noise more reliable nanoelectronics quantum computers. In this paper, we use molecular dynamics develop models Al–AlO –Al by iteratively growing structures with sequential calculations. With approach, see surface grows changes during oxidation simulation. Dynamic processes such evolution charge gradient across oxide, formation holes layer, between amorphous semi-crystalline phases observed. Our results widely agreement previous work reported densities, self-limiting oxidation, increased crystallinity simulation temperature is raised. The encapsulation metal evaporation also studied atom atom. Low density regions at metal–oxide interfaces common feature final junction which persists for different parameters, empirical potentials, crystal orientations aluminium substrate.
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ژورنال
عنوان ژورنال: npj Quantum Information
سال: 2021
ISSN: ['2056-6387']
DOI: https://doi.org/10.1038/s41534-020-00360-4